College of Engineering Unit:
Chemical, Biological, and Environmental Engineering
Project Team Member(s):
Isaac Smythe, Derrick Vong and Sam Dindayal
Project ID:
CHE.02
Project Description:
Analog devices, Inc. deposits a borophosphosilicate glass (BPSG) layer to planarize their silicon wafers for subsequent processing steps. The deposition takes place in a Novellus Concept One, which is a plasma enhanced chemical vapor deposition (PECVD) reactor. The objective of the project is to propose the optimal reactor recipe with design of experiment methodolgy to maximize the planarization while minimizing defects. There are nine variables that can be varied for experimentation, which includes five vapor flow rates, HF power, LF power, temperature, and pressure.
Industry Sponsor(s):
Opportunities:
This team is open to networking
This team is open to employment offers
This team accepts email messages from attendees:
smytheis@oregonstate.edu